This study deals with the investigation of post-discharges resulting from a pulsed magnetron sputtering process. To vary the working conditions in a large range, different sputtering targets and gases are used. The diagnosis of the post-discharge is mainly achieved by a Retarded Field Energy Analyzer (RFEA) and a mass spectrometer. These two techniques enable time resolved characterization of the post-discharge. The study will focus on the ion beam collected under specific HiPIMS regimes as well as the influence of the sputtering target material.