In plasma processing, it is particle fluxes arriving at and leaving surfaces which determine the details of the plasma-surface interaction. Among the various methods that have been proposed for ion flux measurements in plasma processing environments, a novel one was proposed by Braithwaite et al. [1]. This technique uses a planar probe and is tolerant of insulating deposits, it is non-perturbing, it has the potential for absolute flux determination, it is applicable whatever the means of plasma excitation and it is considerably easier to implement than any of the other methods. Based on this previously presented concept, a simplified cost-effective system is hereby presented for use in plasmas free of insulating deposits only.