Laurent Christopher

This work was performed within the framework of the collaborative program PAUD (Plasma Airborne molecular contamination Ultra Desorption) funded by OSEO and certified by French global competitive clusters Minalogic and Trimatec. The aim is to study and develop new technology bricks for next generation molecular decontamination systems, including plasma solution. Previously, an argon inductively coupled plasma (ICP) generated by a radiofrequency (RF) source in a remote (or downstream) reactor was studied with double Langmuir probe measurements and optical emission spectroscopy (OES) diagnostics [1]. In this paper, a parametric study of a Capacitively Coupled Plasma (CCP) generated by the same RF source will be presented. With the same diagnostic tools, the plasma emission, the electronic temperature and density will be investigated for different operating conditions (gas pressure, gas flow and injected power).